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Elionix Wins Nano Tech 2010 Award |
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World’s Finest Electron Beam Lithography System The Elionix ELS-F125 is the only Electron Beam Lithography (EBL) system in the world to guarantee fabrication of 5 nanometer linewidths. NORTH BILLERICA, MA, February 28, 2010 – Elionix, Inc. was recently awarded the distinguished Micro/Processing Technology and Equipment Prize at Nano Tech 2010 held in Tokyo, Japan. The annual Nano Tech award ceremony was held on Friday, February 19th. The award goes to exceptional exhibitors of innovative and pioneering technology or products.
Powered by a newly designed electron optical column, the ELS-F125 is the only Electron Beam Lithography system to offer an acceleration voltage of 125kV. The benefit of using higher accelerating voltages is a reduced beam diameter that allows for the processing of ultra-fine lines. In addition to a higher accelerating voltage, the ELS-F125 has dramatically increased throughput and has realized much less distortion in large write fields from previous generation models.  The Latest 125kV System The ELS-F125 Ken Koseki, Elionix Overseas Marketing Director, comments, “We were pleasantly surprised to be chosen for this award, as Nano Tech is the largest nanotechnology exhibition in the world with over 650 exhibitors from 19 different countries. This award represents the culmination of scientific and engineering excellence from our staff, along with a sincere and attentive desire to meet our customers’ needs through proper planning and communication.” |
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