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New Product Highlight: Elionix ELS-7800 |
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The ELS-7800 Electron Beam Lithography system, an 80kV tool, is the most recent introduction from Elionix. The ELS-7800 offers high performance (8nm lines) and small footprint. Several of these systems are in operation in Asia, and are now being offered in North America. ELS-7800 Brochure (2.46 MB) >>  Elionix ELS-7800 80 kV EBL System
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Harvard Accepts the Elionix ELS-7000 EBL System |
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Harvard researchers recently accepted the Elionix ELS-7000 100kV Electron Beam Lithography system at the Center for NanoScale Systems (CNS). The 100kV system is capable of writing fine patterns of 8nm, and minimizing proximity effects that occur when writing small patterns. The latest CNS NanoWire Newsletter (0.9 MB pdf) states the following regarding the ELS-7000 installation, "During the installation we were able to write finer lines, measuring 5nm, than what the manufacture specifies, 8nm." The instrument is located in LISE G07, the new cleanroom on the ground floor of the LISE building at Harvard.  Elionix ELS-7000 at Harvard's Center for NanoScale Systems
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New to North America, but not new! |
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As shown in the picture above, Optima Managing Director Ryoichi Shiozama, Elionix President Seigo Honme, and STS President Gerald O'Loughlin agree to work as a team to bring North America the very successful electron beam products manufactured by Elionix. |
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