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Two Chemical Engineering Professors Recognized for Technological Achievements

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Using LayTec's EpiCurve TT HR Sensor to Monitor Composition of AlGaN and InAlGaN Barrier Layers

At Ferdinand-Braun-Institute (FBH) in Berlin LayTec's EpiCurveTT HR (High Resolution) sensor is successfully used to optimise the external quantum efficiency and the emission wavelength of LED...

Measuring the Thickness of Deposition Layer During OLED in-Line Evaporation

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Lithography
New Product Highlight: Elionix ELS-7800

The ELS-7800 Electron Beam Lithography system, an 80kV tool, is the most recent introduction from Elionix. The ELS-7800 offers high performance (8nm lines) and small footprint. Several of these systems are in operation in Asia, and are now being offered in North America.

ELS-7800 Brochure (2.46 MB) >>

 
ELS-7500EX **50kV e-Beam Lithography
50 kV E-Beam Lithography System
ELS-7500 EX Features:
  • It is capable of drawing lines of 10nm width.
  • Laser interferometer reads stage position with 0.6nm resolution and helps to achieve at 50nm of stitching and overlay accuracy.

  • The use of 18bit DAC provides electron beam positioning with 0.31nm resolution.

  • The system is operated completely from a PC and is easy to use.

Brochure: ELS-7500EX (809 KB pdf)

 
ELS-7000 **100kV e-Beam Lithography

70kV 

The ELS-7000 features:

  • Employing a large electron current and the maximum acceleration of 100kV, the electron beam of the minimum diameter of 1.8nm is kept stable for a long interval. Even with the resists commonly available on the market, patterns finer than 8nm can be exposed. Based on the achievements of the preceding model, the ELS-7700, the ELS-7000 realized both the long-interval fine electron beam stability and the high throughput.

  • ELS-7000 is equipped with a highly rigid stage, which is based on our long experience in developing lithography systems. The 0.31nm beam positioning resolution is realized by utilizing the 18bit DAC. And, by employing a laser interferometer whose reading resolution is 0.6nm, both the stitching accuracy and overlaying accuracy have attained 40nm. ELS-7000 can expose fine patterns across a large area.

  • Functions for exposing essential elementary graphic patterns are included in the standard specification. The optional circle pattern generator allows generating such patterns as circumferences and arcs. By attaching the fine-step field size modulation function, ELS-7000 can also be instrumental in creating WDM diffraction gratings.

Brochure: ELS-7000 (834 KB pdf)

 

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