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Elionix to host student for NanoJapan internship program |
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The NanoJapan Program, supported by the National Science Foundation, and administered by Rice University, aims to increase the number of U.S. students pursuing studies in nanotechnology. |
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Elionix Wins Nano Tech 2010 Award |
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World’s Finest Electron Beam Lithography System The Elionix ELS-F125 is the only Electron Beam Lithography (EBL) system in the world to guarantee fabrication of 5 nanometer linewidths. NORTH BILLERICA, MA, February 28, 2010 – Elionix, Inc. was recently awarded the distinguished Micro/Processing Technology and Equipment Prize at Nano Tech 2010 held in Tokyo, Japan. The annual Nano Tech award ceremony was held on Friday, February 19th. The award goes to exceptional exhibitors of innovative and pioneering technology or products.
Powered by a newly designed electron optical column, the ELS-F125 is the only Electron Beam Lithography system to offer an acceleration voltage of 125kV. The benefit of using higher accelerating voltages is a reduced beam diameter that allows for the processing of ultra-fine lines. In addition to a higher accelerating voltage, the ELS-F125 has dramatically increased throughput and has realized much less distortion in large write fields from previous generation models.  The Latest 125kV System The ELS-F125 Ken Koseki, Elionix Overseas Marketing Director, comments, “We were pleasantly surprised to be chosen for this award, as Nano Tech is the largest nanotechnology exhibition in the world with over 650 exhibitors from 19 different countries. This award represents the culmination of scientific and engineering excellence from our staff, along with a sincere and attentive desire to meet our customers’ needs through proper planning and communication.” |
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Harvard Accepts the Elionix ELS-7000 EBL System |
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Harvard researchers recently accepted the Elionix ELS-7000 100kV Electron Beam Lithography system at the Center for NanoScale Systems (CNS). The 100kV system is capable of writing fine patterns of 8nm, and minimizing proximity effects that occur when writing small patterns. The latest CNS NanoWire Newsletter (0.9 MB pdf) states the following regarding the ELS-7000 installation, "During the installation we were able to write finer lines, measuring 5nm, than what the manufacture specifies, 8nm." The instrument is located in LISE G07, the new cleanroom on the ground floor of the LISE building at Harvard.  Elionix ELS-7000 at Harvard's Center for NanoScale Systems
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SEMTech Solutions, Inc. announces the opening of its new metrology lab dedicated to surface roughness analysis. Using the Elionix 8900FE system, the lab will detect surface roughness deviations from 1 nm to several hundred microns as well as offering standard SEM features. It will be available for demonstrations and for the analysis of customer samples. For the press release, click here (117 KB pdf).  |
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Duke purchases first Elionix 50 kV EBL System |
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SEMTech Solutions, Inc. has announced that it will deliver the first Elionix 50 kV Electron Beam Lithography (EBL) System to Duke University in October 2007. It will be in operation at Duke's Shared Materials Instrumentation Facility (SMIF). Although this is the first system in the United States, over 30 have been installed across Asia in the last three years. For the press release, click here (98 KB pdf).  |
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