State-of-the-art ultra-high precision electron beam lithography with the maximum acceleration voltage of 80kv.

The ELS-7800 features:

• Adopting a ZrO/W thermal field emission electron gun, the ELS-7800 maintains the electron beam of the minimum diameter of 2nm for a long interval, which is most desirable for the ultra-fine pattern lithography.

• The maximum acceleration voltage of 80kV suppresses the back scattering electrons and thus prevents the line width from widening. This allows for exposing fine lines whose line width is less than 10nm.

• Adopting an 18bit DAC for the beam positioning, the ELS-7800 has achieved the maximum correction position resolution of 0.6nm.