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ELS-7500EX **50kV e-Beam Lithography |
ELS-7500 EX Features: - It is capable of drawing lines of 10nm width.
- Laser interferometer reads stage position with 0.6nm resolution and helps to achieve at 50nm of stitching and overlay accuracy.
- The use of 18bit DAC provides electron beam positioning with 0.31nm resolution.
- The system is operated completely from a PC and is easy to use.
Brochure: ELS-7500EX (809 KB pdf) |
