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Harvard Accepts the Elionix ELS-7000 EBL System

Harvard Accepts the Elionix ELS-7000 EBL System

Harvard researchers recently accepted the Elionix ELS-7000 100kV Electron Beam Lithography system at the Center for NanoScale Systems (CNS). The 100kV system is capable of writing fine patterns of 8nm, and minimizing proximity effects that occur when writing small patterns. The latest CNS NanoWire Newsletter (0.9 MB pdf) states the following regarding the ELS-7000 installation, "During the installation we were able to write finer lines, measuring 5nm, than what the manufacture specifies, 8nm." The instrument is located in LISE G07, the new cleanroom on the ground floor of the LISE building at Harvard.

Elionix ELS-7000

Elionix ELS-7000 at Harvard's Center for NanoScale Systems

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