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Harvard Researchers Select Award Winning 125kV Electron Beam Lithography System
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Published on Tuesday, 24 May 2011 06:18
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Written by Administrator
Elionix Inc., a world leader in electron beam lithography, announces a second order placed by Harvard's Center for Nanoscale Systems for the Elionix ELS-F125 electron beam lithography system.
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The 125kV Elionix electron beam lithography system will become part of the National Science Foundation's National Nanotechnology Infrastructure Network (NNIN), located at Harvard's Center for Nanoscale Systems (CNS). |
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Elionix to host student for NanoJapan internship program
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Published on Monday, 18 May 2009 11:03
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Written by Administrator
The NanoJapan Program, supported by the National Science Foundation, and administered by Rice University, aims to increase the number of U.S. students pursuing studies in nanotechnology.
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Elionix Wins Nano Tech 2010 Award
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Published on Monday, 14 July 2008 07:06
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Written by Administrator
World’s Finest Electron Beam Lithography System The Elionix ELS-F125 is the only Electron Beam Lithography (EBL) system in the world to guarantee fabrication of 5 nanometer linewidths. NORTH BILLERICA, MA, February 28, 2010 – Elionix, Inc. was recently awarded the distinguished Micro/Processing Technology and Equipment Prize at Nano Tech 2010 held in Tokyo, Japan. The annual Nano Tech award ceremony was held on Friday, February 19th. The award goes to exceptional exhibitors of innovative and pioneering technology or products.
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Harvard Accepts the Elionix ELS-7000 EBL System
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Published on Monday, 14 July 2008 07:06
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Written by Administrator
Harvard researchers recently accepted the Elionix ELS-7000 100kV Electron Beam Lithography system at the Center for NanoScale Systems (CNS). The 100kV system is capable of writing fine patterns of 8nm, and minimizing proximity effects that occur when writing small patterns. The latest CNS NanoWire Newsletter (0.9 MB pdf) states the following regarding the ELS-7000 installation, "During the installation we were able to write finer lines, measuring 5nm, than what the manufacture specifies, 8nm." The instrument is located in LISE G07, the new cleanroom on the ground floor of the LISE building at Harvard.  Elionix ELS-7000 at Harvard's Center for NanoScale Systems
New 3-D Metrology Lab
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Published on Monday, 04 June 2007 13:11
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Written by Administrator
SEMTech Solutions, Inc. announces the opening of its new metrology lab dedicated to surface roughness analysis. Using the Elionix 8900FE system, the lab will detect surface roughness deviations from 1 nm to several hundred microns as well as offering standard SEM features. It will be available for demonstrations and for the analysis of customer samples. For the press release, click here (117 KB pdf). 
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